Come to Monterey, California for the technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.
Photomask Technology
- Design automation and data prep (DFM, OPC, SMO)
- Mask write, corrections, process compensation (MPC)
- Mask blanks, defects, and metrology (materials, process, control)
- Mask process (resist, develop, etch, cleans)
- Metrology (CD, placement, AFM, AIMS)
- Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
- Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
- Nanoimprint lithography tools, mask, transfer, and resists
- Deep learning mask technology applications
