Optics.org
daily coverage of the optics & photonics industry and the markets that it serves
News
Menu
First-generation EUV
Shown here in the form of ASML's "NXE: 3400B" tool, the first generation of production EUV lithography systems operates with a numerical aperture of 0.33. ASML is working closely with imec to accelerate the applicability of high-NA reflective optics to pattern even smaller feature sizes into semiconductor circuit designs. Photo: imec.
Copyright © 2021 SPIE EuropeDesigned by Kestrel Web Services