Bruker Advanced Supercon GmbH
About
BASC supplies sources, components, systems, and consultancy for technologies using extreme ultraviolet radiation in EUV-Lithography and Nanotechnology. We supply components and full system solutions (customer specific developments) for research and tests as e.g.
Open frame resist exposers
EUV Reflectometers
EUV-Microscopes
Tools for EUV source characterization
Categories and Product Types